10.2g/Cm3 Molybdenum Target For Photoelectron And Semiconductor

Molybdenum Sputtering Targets For Photoelectron and Semiconductor

Introduction of Molybdenum Sputtering Target

There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target.

Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other industries. It is suitable for all planar coating and rotary coating systems.

Applications of Molybdenum sputtering target:

Molybdenum sputtering target can be applied in vacuum coating industry, ion sputtering, flat panel display industry and photovoltaic industry. Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor.

Molybdenum, with high melting point, high conductivity, good corrosion resistance and other characteristics, and its specific impedance and membrane stress is only half of chromium. In addition, molybdenum is an environmentally friendly material, so there is no need to worry about environmental pollution. Therefore, molybdenum has become one of the preferred sputtering targets for flat panel displays. It is very important that, according to experts, molybdenum can also greatly improve the brightness, contrast, color and other performance of LCD and extend its service life.

For TFT-LCD molybdenum target, we can offer vacuum welding for large-size molybdenum target with copper base plate.

Characteristics and specifications of molybdenum target:

Molybdenum sputtering target has excellent characteristics of molybdenum, such as high melting point, high electrical conductivity, shiny surface, better corrosion resistance and outstanding environmental protection.

Products Collection

10.2g/Cm3 Molybdenum Target

Photoelectron Molybdenum Target

Semiconductor molybdenum pipe

10.2g/Cm3 Molybdenum Target For Photoelectron And Semiconductor Images